![]() A bilayer is formed at saturation with the outer layer not bonded directly to copper. At higher exposure, the molecules adsorb in a tilted position with sulfur and only one nitrogen bonded to copper, leading to a densification of 2-MBI in the monolayer. A fraction of the molecules decomposes upon adsorption, leaving atomic sulfur on copper. On copper surfaces prepared clean in the metallic state, the intact molecules lie flat at low exposure, with sulfur and both nitrogen atoms bonded to copper. 2-mercaptobenzimidazole (2-MBI), a widely used organic inhibitor, was deposited from the vapor phase at ultra-low pressure on copper surfaces in chemically-controlled state, and X-ray photoelectron spectroscopy was used in situ to characterize the adsorption mechanisms upon formation of the inhibiting film. ![]() A model experimental approach, providing molecular scale insight into the build up mechanisms of a corrosion inhibiting interface, is reported.
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